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Luceda E/O Co-Design Integration for Cadence

Accelerate your electro-optical IC development with Luceda Co-Design integration for Cadence, enabling a seamless workflow from photonic synthesis to physical and functional verification. By bridging Luceda’s Python-driven photonic synthesis with Cadence’s gold-standard EPDA ecosystem, this integration eliminates manual transfer errors and reduces time-to-market for next-generation interconnects. 

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Use native Cadence PDK cells to directly implement the IPKISS​ Layout.
 


Leverage Luceda’s full curvilinear design capabilities, as well as verification with Iris DRC.
 


Export from IPKISS to the Cadence Virtuoso environment, with 1:1 cell & metadata matching.   
 


Align PIC & EIC design teams to co-design in lockstep.


​Switch layout in Luceda IPKISS, leveraging Luceda's specialized photonic synthesis.
 

  Exported Layout to Cadence Virtuoso Studio maintaining PDK cell mapping and metadata.

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About this product

The Luceda E/O Co-Design Integration for Cadence links the Luceda Photonics Design Platform with Cadence’s gold-standard EPDA ecosystem. Engineered for fabless PIC design teams building next-generation high-performance interconnects and for foundries, it delivers an automated bridge between Luceda’s specialized Python-driven photonic design synthesis to Cadence’s Virtuoso Studio for electro-optical system integration.

By eliminating traditionally isolated workflows and fragile manual transfers, the Luceda E/O Co-Design Integration for Cadence enables EIC and PIC engineering teams to work in lockstep. Photonic design teams leverage Luceda’s specialized layout, place-and-route, synthesis, and simulation capabilities while maintaining native compatibility with Cadence Virtuoso Studio and Spectre Simulation Platforms.

Ultimately, the Luceda E/O Co-Design Integration for Cadence provides an open, verification-backed environment that ensures first-time-right silicon production, transforming complex PIC-enabled technologies into market-ready interconnect solutions.

Benefits 

For PIC Designers 

  • Eliminate manual file transfer errors and ad-hoc scripting through automated, 1:1 component and parameter mapping between Luceda and Cadence environments, accelerating time-to-market.
  • Identify and resolve optical-specific design rule violations early in Luceda before initiating final full verification in the Cadence environment.
  • Leverage a powerful workflow offering specialized PIC design and analysis capabilities (including curved, all-angle specification-based photonic placement & routing and fast functional validation) without sacrificing compatibility with standard CMOS/EDA design tools.
  • Work in a highly flexible, open EPDA alternative instead of closed, single-vendor proprietary design ecosystems.

For EIC Designers 

  • Easily communicate and collaborate with the PIC design team within your team’s preferred design environment.
  • Provide layout requirements and constraints that can be imported and used directly in the PIC team’s preferred design environment.
  • Effortlessly combine the PIC design with the EIC design and prepare for tape-out, ensuring the layout is fully compatible with Cadence verification routines from the start.

For Foundries

  • Drastically reduce the engineering hours typically required to build, validate, and maintain separate, disjointed PDKs for different design platforms.
  • Effortlessly translate PDKs between Cadence and Luceda to expand your addressable designer market and customer base.

Current Core Features

Cadence PDK Import & 1:1 Mapping:
  • Import Cadence PDKs or custom libraries directly into Luceda with full 1:1 parametric mapping of cells, parameters, and metadata.
  • Synthesize and build complex photonic circuit designs within Luceda using native Cadence PDK components.
Bi-Directional Design Export & IP Generation:
  • Export completed PIC designs back to the Cadence environment with lossless 1:1 parametric mapping of cells, parameters, and metadata.
  • Create advanced PIC IP in Luceda (such as specialized AWGs via AWG Designer) and effortlessly transfer them to the Cadence environment to complete your circuit.

Constraint-Aware PIC Layout:
  • Import layout constraints directly from the Electronic Integrated Circuit (EIC) layout.
  • Account for physical, spatial, and electrical constraints during PIC layout implementation inside Luceda to ensure error-free electro-optical co-design.
Multi-Stage Electro-Optical Verification:
  • Photonic DRC: Catch and resolve design rule violations early using Iris DRC directly inside Luceda.
  • System Verification: Execute Layout Versus Schematic (LVS) and Check Against Source (CAS) within the Cadence environment to ensure full system functionality prior to tape-out.

 Pre-register for our Upcoming Webinar


Pre-register now and be the first to know when registration opens
for our upcoming webinar on Luceda E/O Co-Design Integration for Cadence. 


Thanks for registering!

Interested in trying it out? Questions?