Closing the Gap Between PIC Designers and Foundries: DRC in PIC Design

As the photonic integrated circuit (PIC) industry advances toward large-scale integration, robust Design Rule Checking (DRC) has become essential for a successful tape-out. Yet for many PIC designers, this final step in the design flow is often the most time-consuming and frustrating. Unexpected last-minute issues, repeated back-and-forth communication with foundries, and multiple revision cycles can delay projects, increase costs, and create unnecessary stress, ultimately extending time to market. Ensuring that a design is reliable and ready for tape-out the first time helps prevent costly iterations and keeps projects on track.

Join us for a webinar where we will demonstrate our brand-new product, Luceda DRC, which is a solution that bridges the gap between foundry requirements and design intent. Luceda DRC enables you to identify and resolve design rule violations directly in the same environment where you design your PICs and validate your designs against foundry rules. Luceda’s native DRC engine integrates design and verification in a single workflow, helping you detect and resolve violations early, ensure reliable, foundry-compliant PIC designs, and move toward successful tape-outs with confidence.

In this webinar, you will learn how to:

• Run rule decks with Luceda’s DRC engine and validate designs against foundry rules.
• Identify and resolve common PIC design errors early in the design process.
• Select different rule groups, run density checks, and easily scan through violations in the Luceda Layout Visualizer.
• Run DRC and visualize violations in a different tool, even without an IPKISS license.

Register now to deepen your understanding of DRC in PIC design, learn more about the Luceda DRC, and see how Luceda enables you to create tape-out-ready PICs with confidence, while shortening development cycles and accelerating time to market.

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