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SMART Photonics and Luceda Photonics release a PDK for the IPKISS integrated photonics design flow.

Photonic IC technology is maturing and designers need process design kits as the foundation of their design flow. Process design kits facilitate knowledge transfer between foundries and designers on layout and simulation models. SMART Photonics is the world's first pure-play foundry for Indium...Read more

IPKISS at Group IV Photonics: Layout-Aware Yield Prediction of Photonic Circuits

29-31 August 2018 / Cancun Mexico IPKISS was used to predict the yield of filter circuits in the presence of fabrication variations based on spatially correlated maps of linewidth and thickness. The article illustrates how IPKISS can enable mature organizations to take a big leap forward and create...Read more

Proud to be part of the SIMULIA Community News

The May 2018 issue of the SIMULIA Community News covers the CST products and highlights Luceda as CST's photonics partner. A very interesting issue to read as it largely covers EM/uW and integrated photonics applications for automotive, aerospace, telecom and satcom. Click here to get access to the...Read more

The new IPKISS 3.1.3 release moves the edges in PIC PDK building

IPKISS combines circuit level design and simulation, layout and device CAD in one single quality-controlled PDK. Mature organizations can now take a big leap forward and create a design flow that is more reliability and scalable and that will enable them to consolidate their knowledge in a fast...Read more

It is our 4th birthday today!!

A short flash back W e have put 3 products on the market: IPKISS.flow, IPKISS.eda and FilterToolbox L uceda N.V. raises capital from imec and SOFI/PMV W e have more than doubled the orders each year - year after year. W e are cash-flow positive since the entire 3rd business year W e have acquired...Read more

CORNERSTONE Announces Multi Project Wafer Run 8

The mask submission deadline is Friday 31 st August 2018. The design rules for CORNERSTONE multi project wafer (MPW) run 8 on the 220 nm Si / 2 µm BOX SOI platform have been announced. We will offer 2 Si etch processes: 1) a shallow Si etch of 70 nm (grating couplers), and 2) a partial Si etch of...Read more

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